Ebina, Japan

Inui Toshiharu

This inventor holds 1 USPTO granted patent. Top assignee: Fuji Xerox Co., Ltd.. Active years: 1989.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Inui Toshiharu. Retrieved from https://idiyas.com/inventor/inui-toshiharu

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 28(Granted Patents)


Company Filing History:


Years Active: 1989

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1 patent (USPTO):Explore Patents

Title: Inui Toshiharu: Pioneering Inventor from Ebina, Japan

Introduction: Inui Toshiharu is a renowned inventor hailing from the vibrant city of Ebina, Japan. With a passion for innovation and a keen eye for detail, he has made significant contributions to the field of technology through his groundbreaking inventions.

Latest Patents: Inui Toshiharu holds several patents in the areas of robotics, artificial intelligence, and sustainable energy solutions. His recent patents focus on enhancing efficiency in industrial processes and improving the quality of life for individuals through innovative technologies.

Career Highlights: Throughout his illustrious career, Inui Toshiharu has worked with leading tech companies to bring his inventions to life. His dedication to pushing the boundaries of what is possible has earned him recognition as a trailblazer in the world of innovation.

Collaborations: Inui Toshiharu has collaborated with top researchers, engineers, and designers to develop cutting-edge solutions that address pressing global challenges. His collaborative spirit and interdisciplinary approach have led to the creation of revolutionary products that have the potential to shape the future.

Conclusion: Inui Toshiharu's relentless pursuit of innovation and his commitment to excellence continue to inspire the next generation of inventors. His impact on the world of technology is undeniable, and his legacy will undoubtedly endure for years to come.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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