Yongin-si, South Korea

Inhye Park

This inventor holds 1 USPTO granted patent. Top assignee: Samsung Display Co., Ltd.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Inhye Park. Retrieved from https://idiyas.com/inventor/inhye-park-d3yannb3

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 1.0


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Inhye Park: Optical Inspection Innovation

Introduction

Inhye Park is an inventor based in Yongin-si, South Korea. His patent work includes an optical inspection system and method designed to process images of substrates efficiently.

Latest Patents

Park is associated with one patent: “Optical Inspection System and Optical Inspection Method.” The system uses cameras to capture images of separate substrate areas. Inspection computers receive the corresponding partial images and transmit them over a many-to-one network to a storage computer. The storage computer merges the partial images into a full original image, then extracts an effective area to create a full compressed image. This approach combines distributed image capture and processing with centralized image assembly and compression.

Career Highlights

Park is associated with Samsung Display Co., Ltd. His patent describes an image-processing workflow for optical inspection, from capturing partitioned substrate areas to generating a compressed image.

Collaborations

The provided information lists Hyunduck Kim and Yeong-chang Yi as Park’s coworkers. It does not specify their roles in the patent or whether they collaborated with him on this invention.

Conclusion

Inhye Park’s patent focuses on coordinating image capture, transmission, merging, and compression for optical inspection, reflecting his connection to display-related technology at Samsung Display Co., Ltd.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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