Taipei, Taiwan

Ing-Yih Leu


Average Co-Inventor Count = 8.5

ph-index = 2

Forward Citations = 23(Granted Patents)


Location History:

  • Da-an District, TW (2011)
  • Taipei, TW (2013)

Company Filing History:


Years Active: 2011-2013

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2 patents (USPTO):

Title: Ing-Yih Leu: Pioneering Innovations in Speaker Technology

Introduction:

Ing-Yih Leu, a distinguished inventor hailing from Taipei, Taiwan, is renowned for his unwavering dedication to innovation and technological advancement. With a keen eye for detail and a passion for pushing boundaries, Leu's work continues to inspire a new generation of inventors.

Latest Patents:

1. Electret diaphragm and speaker using the same: Leu's groundbreaking patent introduces an electret diaphragm with unique features, including an electret layer, bonding layer, and aluminum electrode layer. This technology enhances speaker performance and sound quality significantly.

2. Electrostatic loudspeaker array: Leu's inventive speaker system incorporates advanced components like an audio signal-receiving interface, modulating circuit, phase-control circuit, and speaker units. This patent revolutionizes the audio industry with its innovative design and functionality.

Career Highlights:

Throughout his illustrious career, Leu has made significant contributions to renowned institutions like the National Taiwan University and the Industrial Technology Research Institute. His innovative research and patented technologies have played a pivotal role in shaping the future of speaker technology.

Collaborations:

Leu's collaborative spirit is evident in his work with esteemed colleagues such as Chih-Kung Lee and Wen-Ching Ko. Together, they have explored new frontiers in speaker technology, fostering a culture of creativity and excellence in their research endeavors.

Conclusion:

Ing-Yih Leu's exceptional talent, coupled with his relentless pursuit of excellence, has firmly established him as a trailblazer in the field of speaker technology. His innovative patents and collaborative efforts continue to inspire and influence the next wave of inventors, leaving an indelible mark on the future of technology.

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