Bengaluru, India

Inayat Nandihalli

This inventor holds 1 USPTO granted patent. Top assignee: Honeywell International Inc.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Inayat Nandihalli. Retrieved from https://idiyas.com/inventor/inayat-nandihalli

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Inayat Nandihalli: Innovator in Airfield Safety

Introduction

Inayat Nandihalli is an inventor based in Bengaluru, India, and is associated with Honeywell International Inc. His work includes an invention designed to help detect and clear debris obstructing airfield luminaire lenses. The available information identifies 1 patent associated with him.

Latest Patents

Nandihalli’s patent, “Airfield Luminaire Obstruction Detection,” describes methods, devices, and systems for identifying debris on an airfield luminaire lens. A controller receives a signal from the luminaire’s light sensor and uses it to determine whether the lens is obstructed. Depending on the obstruction and the luminaire’s temperature, the controller can activate a vibration mechanism, a heating mechanism, or both to help clear the debris.

Career Highlights

The described invention addresses a practical airfield maintenance challenge: keeping luminaire lenses clear so that debris does not interfere with their operation. Its sensor-based detection and responsive clearing mechanisms combine monitoring with automated action.

Collaborations

Nipun Kumar Chawda and Karunakar Mahadevappa Kamadolli are identified as Nandihalli’s coworkers. The available information does not specify their roles in the patent or the invention.

Conclusion

Inayat Nandihalli’s airfield luminaire obstruction detection patent presents a sensor-guided approach to identifying and clearing debris, contributing an inventive solution to airfield lighting maintenance.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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