Incheon, South Korea

In Suk Lee

This inventor holds 1 USPTO granted patent. Top assignee: Tovis Co., Ltd.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: In Suk Lee. Retrieved from https://idiyas.com/inventor/in-suk-lee-o5h0ioss

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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Average Co-Inventor Count = 1.0


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: In Suk Lee - Innovator in Display Technology

Introduction

In Suk Lee is a prominent inventor based in Incheon, South Korea. He has made significant contributions to the field of display technology, particularly with his innovative designs and manufacturing methods.

Latest Patents

In Suk Lee holds a patent for a "Partially curved or foldable display device including recess grooves and manufacturing method therefor." This invention describes a display device that features a first folding area, a first non-folding area, and a second non-folding area. The device comprises a first substrate, a second substrate, a liquid crystal layer, and an upper polarization member. The design allows for a unique thickness variation in the folding area compared to the non-folding areas, enhancing the functionality and versatility of the display.

Career Highlights

In Suk Lee is associated with Tovis Co., Ltd., a company known for its advancements in display technologies. His work has been instrumental in pushing the boundaries of what is possible in display design and functionality.

Collaborations

He has collaborated with notable coworkers, including Yong Beom Kim and Ryong Min Park, contributing to various projects that aim to innovate and improve display technologies.

Conclusion

In Suk Lee's contributions to the field of display technology exemplify the spirit of innovation. His patented designs and collaborative efforts continue to influence the industry and pave the way for future advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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