Yongin, South Korea

In-Su Choi

This inventor holds 1 USPTO granted patent. Top assignee: Samsung Display Co., Ltd.. Active years: 2013.

IDiyas Innovation Intelligence. (2026). Inventor Profile: In-Su Choi. Retrieved from https://idiyas.com/inventor/in-su-choi-hhdt2ibo

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 8.0

ph-index = 1


Company Filing History:


Years Active: 2013

Loading Chart...
1 patent (USPTO):Explore Patents

Title: In-Su Choi: Innovator in Substrate Cutting Technology

Introduction

In-Su Choi is a notable inventor based in Yongin, South Korea. He has made significant contributions to the field of substrate cutting technology, particularly through his innovative patent.

Latest Patents

In-Su Choi holds a patent for a "Substrate cutting apparatus and method of cutting substrate using the same." This invention features a stage designed to support a substrate for cutting along a virtual cutting line. It includes a laser generator that emits an ultraviolet (UV)-based laser beam to cut the substrate by removing parts along the cutting line. Additionally, a beam oscillator is integrated into the apparatus, which performs a beam swing on the laser beam in a direction parallel to the cutting line's length by oscillating the tilt angle of the laser beam.

Career Highlights

In-Su Choi is currently employed at Samsung Display Co., Ltd., where he continues to develop and refine cutting-edge technologies. His work has positioned him as a key player in the advancement of substrate cutting methods.

Collaborations

He has collaborated with notable colleagues, including Hyun-Chul Lee and Gyoo-Wan Han, contributing to various projects within the company.

Conclusion

In-Su Choi's innovative work in substrate cutting technology exemplifies the impact of dedicated inventors in advancing industrial processes. His contributions continue to shape the future of substrate applications.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…