Suwon, South Korea

In-Hyup Hwang

This inventor holds 1 USPTO granted patent and 2 published patent applications and 1 EPO patent. Top assignee: Samsung Electronics Co., Ltd.. Active years: 2020.

IDiyas Innovation Intelligence. (2026). Inventor Profile: In-Hyup Hwang. Retrieved from https://idiyas.com/inventor/in-hyup-hwang

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

% Patents Active = 100.0

 

Average Co-Inventor Count = 38.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2020

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1 patent (USPTO):Explore Patents

Title: In-Hyup Hwang: Innovator in Electronic Communication Devices

Introduction

In-Hyup Hwang is a notable inventor based in Suwon-si, South Korea. He has made significant contributions to the field of electronic communication devices. His innovative work has led to the development of a patent that enhances the functionality of electronic devices.

Latest Patents

In-Hyup Hwang holds a patent for an "Electronic device using logical channels for communication." This invention provides an apparatus and method for establishing one or more protocols for electronic devices. The method involves creating physical channels with external devices, utilizing communication modules, and executing multiple application programs to facilitate data communication through logical channels.

Career Highlights

Hwang is currently employed at Samsung Electronics Co., Ltd., where he continues to push the boundaries of technology. His work at Samsung has allowed him to be at the forefront of innovation in electronic devices.

Collaborations

Some of his notable coworkers include Ki-Soo Cho and Aravind V Iyer. Their collaboration has contributed to the advancement of technology within the company.

Conclusion

In-Hyup Hwang's contributions to electronic communication devices exemplify the spirit of innovation. His patent reflects a commitment to enhancing the functionality of electronic devices, making a lasting impact in the field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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