Asan, South Korea

In Hyo Hwang

This inventor holds 2 USPTO granted patents and 3 published patent applications. Top assignee: Samsung Electronics Co., Ltd.. Active years: 2024-2025.

USPTO Granted Patents = 2 

% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1


Company Filing History:


Years Active: 2024-2025

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2 patents (USPTO):Explore Patents

Title: In Hyo Hwang: Innovator in Semiconductor Technology

Introduction

In Hyo Hwang is a notable inventor based in Asan-si, South Korea. He has made significant contributions to the field of semiconductor technology, holding a total of 2 patents. His work focuses on enhancing the efficiency and reliability of semiconductor packages.

Latest Patents

Hwang's latest patents include innovative designs for semiconductor packages. One of his patents describes a semiconductor package that incorporates a stiffener. This package consists of a circuit board, a semiconductor chip mounted on the circuit board, and a stiffener surrounding the semiconductor chip. The stiffener is composed of a first metal layer, a core layer, and a second metal layer, all of which are sequentially stacked to improve structural integrity and performance.

Career Highlights

In Hyo Hwang is currently employed at Samsung Electronics Co., Ltd., a leading company in the technology sector. His role at Samsung allows him to work on cutting-edge projects that push the boundaries of semiconductor technology. His expertise and innovative approach have made him a valuable asset to the company.

Collaborations

Hwang collaborates with various professionals in his field, including his coworker Ae-Nee Jang. Together, they work on advancing semiconductor technologies and exploring new applications for their inventions.

Conclusion

In Hyo Hwang is a prominent figure in the semiconductor industry, known for his innovative patents and contributions to technology. His work continues to influence the development of efficient semiconductor packages, showcasing his commitment to advancing the field.

Profile summary based on public USPTO records.
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