Iljae Shin

Title: The Innovative Mind of Iljae Shin

Introduction

Iljae Shin is a prominent inventor based in Seongnam-si, South Korea. He has made significant contributions to the field of semiconductor technology, particularly with his innovative designs and patents. His work is recognized for its potential to advance memory device technology.

Latest Patents

Iljae Shin holds a patent for a three-dimensional semiconductor memory device. This device features first semiconductor patterns that are vertically spaced apart on a substrate. Each pattern includes first and second end portions, as well as first and second side surfaces that connect these end portions. The design incorporates first and second source/drain regions adjacent to the end portions, a channel region between these source/drain regions, and a first word line that is vertically extended. Additionally, a gate insulating layer is interposed between the first word line and the side surfaces, which may also extend to be interposed between the source/drain regions.

Career Highlights

Iljae Shin is currently employed at Samsung Electronics Co., Ltd., a leading company in the technology sector. His work at Samsung has allowed him to be at the forefront of semiconductor innovation. His contributions have been instrumental in developing advanced memory solutions that meet the growing demands of modern technology.

Collaborations

Iljae Shin has collaborated with notable colleagues, including Joongchan Shin and Changkyu Kim. These collaborations have fostered a creative environment that encourages innovation and the development of cutting-edge technologies.

Conclusion

Iljae Shin's work in semiconductor memory devices exemplifies the spirit of innovation in technology. His contributions continue to shape the future of memory solutions, making him a key figure in the field.