Berkeley, CA, United States of America

Ilia Kalinovshi

This inventor holds 1 USPTO granted patent. Top assignee: Novellus Systems Incorporated. Active years: 2011.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Ilia Kalinovshi. Retrieved from https://idiyas.com/inventor/ilia-kalinovshi

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 15(Granted Patents)


Company Filing History:


Years Active: 2011

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1 patent (USPTO):Explore Patents

Title: Ilia Kalinovshi: Innovator in Plasma Technology

Introduction

Ilia Kalinovshi is a notable inventor based in Berkeley, California. He has made significant contributions to the field of plasma technology, particularly through his innovative designs and patents. His work is recognized for its impact on various industrial applications.

Latest Patents

One of Ilia Kalinovshi's key patents is the "Plasma reactor showerhead face plate having concentric ridge pattern." This invention showcases his expertise in enhancing the efficiency and effectiveness of plasma reactors, which are crucial in semiconductor manufacturing processes. He holds a total of 1 patent.

Career Highlights

Ilia Kalinovshi is currently employed at Novellus Systems Incorporated, a company known for its advanced semiconductor manufacturing equipment. His role at Novellus Systems allows him to apply his innovative ideas in a practical setting, contributing to the company's success in the industry.

Collaborations

Throughout his career, Ilia has collaborated with talented individuals such as Ivelin A Angelov and James Eugene Caron. These collaborations have fostered a creative environment that encourages the development of groundbreaking technologies.

Conclusion

Ilia Kalinovshi is a distinguished inventor whose work in plasma technology continues to influence the semiconductor industry. His innovative spirit and dedication to advancing technology are evident in his contributions and collaborations.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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