Petach-Tikva, Israel

Ilan Ben-David

This inventor holds 1 USPTO granted patent. Top assignee: Optrotech Ltd.. Active years: 1993.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Ilan Ben-David. Retrieved from https://idiyas.com/inventor/ilan-ben-david-6elpnbxq

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 5(Granted Patents)


Company Filing History:


Years Active: 1993

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1 patent (USPTO):Explore Patents

Title: Ilan Ben-David: Innovator in Sheet Material Processing

Introduction

Ilan Ben-David is a notable inventor based in Petach-Tikva, Israel. He has made significant contributions to the field of sheet material processing through his innovative methods and systems. His work focuses on enhancing the precision of artwork creation on sheet materials.

Latest Patents

Ilan Ben-David holds a patent for a "Method and system for punching holes in a sheet material." This invention provides a systematic approach to forming artwork on sheet materials while ensuring that holes are punched in precise registration with the artwork. The method involves securing the sheet material on a working surface, where each hole corresponds to a socket, allowing for accurate alignment and execution.

Career Highlights

Ilan is associated with Optrotech Ltd., where he applies his expertise in developing advanced technologies for sheet material processing. His innovative approach has led to the creation of a method that not only improves efficiency but also enhances the quality of the final product.

Collaborations

Ilan collaborates with Nitsan Kochavi, working together to push the boundaries of innovation in their field. Their partnership exemplifies the importance of teamwork in driving technological advancements.

Conclusion

Ilan Ben-David's contributions to the field of sheet material processing highlight his innovative spirit and dedication to precision. His patent reflects a significant advancement in the industry, showcasing the potential for further developments in this area.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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