Suwon, South Korea

Il-sun Hwang

This inventor holds 1 USPTO granted patent. Top assignee: Hewlett-Packard Development Company, L.p.. Active years: 2020.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Il-sun Hwang. Retrieved from https://idiyas.com/inventor/il-sun-hwang-2bbvj0xw

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 7.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2020

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Il-sun Hwang: Innovator in Photosensitive Technology

Introduction

Il-sun Hwang is a notable inventor based in Suwon, South Korea. He has made significant contributions to the field of photosensitive technology, particularly through his innovative patent. His work is recognized within the industry, and he is associated with Hewlett-Packard Development Company, L.P.

Latest Patents

Il-sun Hwang holds a patent for a "Photosensitive body including protective layer formed on photosensitive layer." This invention features a photosensitive body that comprises a photosensitive layer and a protective layer formed on top of it. The protective layer is composed of a urethane oligomer acrylate and a modified perfluoropolyether acrylate, showcasing his expertise in materials science and engineering.

Career Highlights

Throughout his career, Il-sun Hwang has demonstrated a commitment to advancing technology in his field. His work at Hewlett-Packard Development Company, L.P. has allowed him to collaborate with other talented professionals and contribute to innovative projects.

Collaborations

Some of his notable coworkers include Young-soo Ha and Sung-hoon Kang. Their collective efforts have likely played a role in the development of cutting-edge technologies within the company.

Conclusion

Il-sun Hwang's contributions to photosensitive technology exemplify the impact of innovation in the industry. His patent reflects a deep understanding of materials and their applications, marking him as a significant figure in his field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…