Gyeonggi-do, South Korea

Il Kwang Yang

This inventor holds 2 USPTO granted patents and 2 published patent applications. Top assignee: Eugene Technology Co., Ltd.. Active years: 2016-2017.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Il Kwang Yang. Retrieved from https://idiyas.com/inventor/il-kwang-yang-u6070dh1

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 2 

% Patents Active = 100.0

Average Co-Inventor Count = 3.4

ph-index = 1


Company Filing History:


Years Active: 2016-2017

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2 patents (USPTO):Explore Patents

Title: Il Kwang Yang: Innovator in Plasma Technology

Introduction

Il Kwang Yang is a notable inventor based in Gyeonggi-do, South Korea. He has made significant contributions to the field of plasma technology, holding a total of 2 patents. His work focuses on innovative apparatuses that enhance plasma treatment processes.

Latest Patents

Yang's latest patents include a plasma treatment apparatus and a plasma antenna. The plasma treatment apparatus is designed to create an electric field within a chamber, generating plasma from a supplied source gas. This apparatus features a helical antenna that facilitates the plasma generation process. The plasma antenna, on the other hand, is designed to form electric fields in a similar manner, showcasing Yang's expertise in utilizing plasma for various applications.

Career Highlights

Yang is currently employed at Eugene Technology Co., Ltd., where he continues to develop cutting-edge technologies in plasma treatment. His innovative designs have the potential to revolutionize processes in various industries, including semiconductor manufacturing and materials processing.

Collaborations

Yang has collaborated with notable colleagues such as Byung Gyu Song and Sang Ho Woo. Their combined expertise contributes to the advancement of plasma technology and its applications.

Conclusion

Il Kwang Yang's contributions to plasma technology through his patents and collaborations highlight his role as a leading inventor in this field. His work continues to pave the way for future innovations in plasma applications.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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