Seoul, South Korea

Il-ha Lee

This inventor holds 1 USPTO granted patent. Top assignee: Samsung Electronics Co., Ltd.. Active years: 2013.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Il-ha Lee. Retrieved from https://idiyas.com/inventor/il-ha-lee-ozx5jq1u

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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Company Filing History:


Years Active: 2013

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1 patent (USPTO):Explore Patents

Title: Il-ha Lee: Innovator in Carbon Nanotube Technology

Introduction

Il-ha Lee is a prominent inventor based in Seoul, South Korea. He has made significant contributions to the field of nanotechnology, particularly in the manufacturing of carbon nanotube device arrays. His innovative approach has the potential to advance various applications in electronics and materials science.

Latest Patents

Il-ha Lee holds a patent for a "Method of manufacturing carbon nanotube device array." This patent outlines a process where catalyst patterns are formed using a photolithography technique. Following this, carbon nanotubes (CNTs) are grown from these catalyst patterns, and electrodes are subsequently formed on the grown CNTs. This method represents a crucial step in the development of advanced electronic devices.

Career Highlights

Il-ha Lee is currently employed at Samsung Electronics Co., Ltd., a leading global technology company. His work at Samsung has allowed him to collaborate with some of the brightest minds in the industry, contributing to groundbreaking advancements in technology.

Collaborations

Some of his notable coworkers include Un-jeong Kim and Eun-hong Lee. Their collaborative efforts have further enhanced the research and development of innovative technologies within the company.

Conclusion

Il-ha Lee's contributions to carbon nanotube technology exemplify the spirit of innovation in the field of electronics. His work not only advances scientific understanding but also paves the way for future technological breakthroughs.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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