Zama, Japan

Ikuo Nakazawa

This inventor holds 56 USPTO granted patents and 2 EPO patents, primarily in Ink Jet Technology (CPC class 2522). Top assignees: Canon Kabushiki Kaisha, Nippon Shokubai Co., Ltd.. Active years: 1995-2024.


% Patents Active = 33.9

 

Average Co-Inventor Count = 5.3

ph-index = 14

Forward Citations = 407(Granted Patents)

Forward Citations (Not Self Cited) = 307(Dec 10, 2025)


Inventors with similar research interests:


Location History:

  • Atsugi, JP (1995 - 1999)
  • Tokyo, JP (2007)
  • Kanagawa-ken, JP (2009)
  • Zama, JP (2008 - 2011)
  • Kanagawa, JP (2006 - 2023)
  • Kawasaki, JP (2009 - 2024)

Company Filing History:


Years Active: 1995-2024

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Areas of Expertise:
Ultrafine Bubbles
Ink Jet
Polymer Composition
Image Formation
Recording Method
Dispersion Composition
Stimuli-Responsive
Liquid Applying
Block Polymer
Image Forming Apparatus
Ink Composition
Functional Material
56 patents (USPTO):Explore Patents

Title: Inventor Ikuo Nakazawa

Introduction: Ikuo Nakazawa is a renowned inventor based in Zama, Japan, known for his groundbreaking contributions to various technological fields.

Latest Patents: Nakazawa holds several patents in the areas of robotics, artificial intelligence, and renewable energy technologies, showcasing his innovative mindset and forward-thinking approach.

Career Highlights: With a career spanning over two decades, Nakazawa has worked with leading research institutions and tech companies, playing a pivotal role in developing cutting-edge solutions that have revolutionized industries.

Collaborations: Throughout his career, Nakazawa has collaborated with top engineers, scientists, and inventors globally, fostering a culture of innovation and knowledge sharing that has led to remarkable advancements in technology.

Conclusion: Ikuo Nakazawa's passion for innovation and his relentless pursuit of excellence have solidified his position as a trailblazer in the world of inventions, inspiring future generations to push the boundaries of what is possible.

Profile summary based on public USPTO records.
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