Company Filing History:
Years Active: 2009
Title: II-Young Yoon: Innovator in Semiconductor Technology
Introduction
II-Young Yoon is a prominent inventor based in Hwaseong-si, South Korea. He has made significant contributions to the field of semiconductor technology. His innovative approach has led to the development of a unique method for forming semiconductor devices.
Latest Patents
Yoon holds a patent for a "Method of forming the semiconductor device." This patent describes example embodiments that provide a semiconductor device and a method of forming the same. According to the method, a capping insulation pattern is formed to cover the top surface of a filling insulation pattern in a trench. The capping insulation pattern exhibits etch selectivity according to the filling insulation pattern. As a result, the likelihood that the filling insulation layer may be etched by various cleaning processes and the process of removing the buffer insulation pattern may be reduced or prevented.
Career Highlights
Yoon is currently employed at Samsung Electronics Co., Ltd., a leading company in the electronics industry. His work at Samsung has allowed him to be at the forefront of semiconductor innovation. He has demonstrated a commitment to advancing technology through his research and development efforts.
Collaborations
Some of Yoon's notable coworkers include Hong-Jae Shin and Nae-in Lee. Their collaboration has contributed to the success of various projects within the semiconductor field.
Conclusion
II-Young Yoon is a key figure in semiconductor innovation, with a focus on improving device formation methods. His contributions continue to shape the future of technology in this critical industry.