Ihavin Sinha

Title: Innovations by Ihavin Sinha

Ihavin Sinha is a notable inventor based in New Westminster, Canada. He has made significant contributions to the field of technology, particularly in the area of magnetic head coil structures. His innovative approach has led to the development of a unique method that enhances the efficiency of coil production.

Latest Patents

Ihavin Sinha holds a patent for a "Method for producing tight pitched coil with reduced processing steps." This patent outlines methods for fabricating thin film magnetic head coil structures. The process involves the deposition of a first thick seed layer, followed by an ultra-thin second seed layer. The resulting coil structures exhibit sub-micron pitch and high aspect ratios. The ultra-thin second seed layer is removed from between the coil windings through an isotropic etch process, such as wet etching or RIE. After the selective removal, the first thick seed layer is utilized to deposit pole and backgap structures, streamlining the production process.

Career Highlights

Ihavin Sinha is currently employed at Hitachi Global Storage Technologies Netherlands B.V. His work at this esteemed company has allowed him to further his research and development in innovative technologies. His expertise in the field has made him a valuable asset to his team.

Collaborations

Some of his coworkers include Christian Rene Bonhote and Quang Le. Their collaboration has likely contributed to the advancement of their projects and innovations.

Conclusion

Ihavin Sinha's contributions to the field of technology through his innovative patent demonstrate his commitment to advancing the industry. His work continues to influence the development of efficient manufacturing processes in magnetic head coil structures.