Hikone, Japan

Ichirou Kishi

This inventor holds 1 USPTO granted patent. Top assignee: Matsushita Electric Works, Ltd.. Active years: 1986.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Ichirou Kishi. Retrieved from https://idiyas.com/inventor/ichirou-kishi

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 46(Granted Patents)


Company Filing History:


Years Active: 1986

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Ichirou Kishi: Innovator in Fluid Material Extrusion

Introduction

Ichirou Kishi is a notable inventor based in Hikone, Japan. He has made significant contributions to the field of fluid material extrusion. His innovative designs have led to advancements in the efficiency and functionality of extruders.

Latest Patents

Ichirou Kishi holds a patent for an "Extruder for a fluid material." This invention includes a cartridge containing a fluid material and pushing members designed to extrude the fluid material. The pushing members are driven by a system of a pinion and racks, which are put in motion through reduction gears. This patent showcases his expertise in mechanical engineering and fluid dynamics.

Career Highlights

Kishi is associated with Matsushita Electric Works, Ltd., a company known for its commitment to innovation and quality in electronic products. His work at this esteemed organization has allowed him to develop and refine his inventions, contributing to the company's reputation in the industry.

Collaborations

Ichirou Kishi has collaborated with talented individuals such as Shunichi Hata and Makoto Miyata. These partnerships have fostered a creative environment that encourages the exchange of ideas and expertise, leading to successful innovations.

Conclusion

Ichirou Kishi's contributions to the field of fluid material extrusion exemplify his dedication to innovation and engineering excellence. His patent and collaborations reflect a commitment to advancing technology in meaningful ways.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…