Koshi, Japan

Ichiro Shimomura



Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 3(Granted Patents)


Company Filing History:


Years Active: 2009

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1 patent (USPTO):Explore Patents

Title: Ichiro Shimomura: Innovator in Edge Exposure Technology

Introduction: Ichiro Shimomura, an inventive mind hailing from Koshi, Japan, has made noteworthy contributions to the field of photolithography. With a focus on enhancing the efficiency and precision of exposure techniques in manufacturing processes, Shimomura has secured his place in the innovation landscape.

Latest Patents: Shimomura holds a patent for an "Edge exposure apparatus, coating and developing apparatus, and edge exposure method." This groundbreaking invention comprises a first and a second optical path forming member strategically arranged within the light beam path from a light source. It features two mounting tables capable of rotating about a vertical axis, which allows for edge exposure of substrates simultaneously. The implementation of a common light source optimizes processing capabilities while mitigating size increase in the apparatus. This innovation significantly enhances the operational efficiency of photolithography processes.

Career Highlights: Currently, Ichiro Shimomura is affiliated with Tokyo Electron Limited, a leader in semiconductor production equipment. His work reflects a profound understanding of technological advancements and their implications for industry practices. With his single patent, he has contributed to the progression of edge exposure methodologies, showcasing his commitment to innovation.

Collaborations: Throughout his career, Shimomura has worked alongside accomplished professionals, including his esteemed coworker, Yasuharu Iwashita. Together, they have engaged in research endeavors aimed at enhancing exposure techniques that are vital to semiconductor manufacturing.

Conclusion: Ichiro Shimomura represents the spirit of innovation within the technology sector, demonstrating how targeted improvements in existing processes can lead to significant advancements. His patent on edge exposure technology underlines the importance of inventive thinking in achieving efficiency and precision within the semiconductor industry. As innovation continues to evolve, Shimomura’s contributions remain a pivotal aspect of ongoing technological development.

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