Ichiro Ishiyama

Title: Ichiro Ishiyama: Inventor in Semiconductor Alignment and Pattern Transfer

Introduction

Ichiro Ishiyama is an inventor based in Kawasaki, Japan, whose work includes technologies for aligning objects and transferring patterns in semiconductor manufacturing. He is associated with Canon Kabushiki Kaisha and is credited with 4 patents.

Latest Patents

Two of Ishiyama’s latest patents concern precision optical systems used in pattern alignment and transfer.

The alignment device patent describes a system for aligning a reticle and wafer using a projection lens that transfers an integrated-circuit pattern. Light reflected from the wafer passes through the projection lens and is directed toward a spatial filter. The filter’s position is adjusted according to the relative optical axes and the projection lens’s telecentricity, helping extract the signal used to determine the reticle’s and wafer’s relative positions while reducing the effect of objective-lens movement.

The pattern transfer apparatus patent describes equipment that irradiates a first object to align it with a second object, transfer a pattern, or perform both operations. An optical device in the beam path corrects or prevents changes in optical path length caused by variations in the first object’s thickness.

Career Highlights

Ishiyama’s listed inventions address optical alignment and pattern-transfer challenges relevant to semiconductor fabrication. His association with Canon Kabushiki Kaisha connects his patent work to a company active in optical and imaging technologies.

Collaborations

Ishiyama’s listed coworkers include Hiroshi Sato and Akiyoshi Suzuki. Their names provide context for the professional network associated with his work.

Conclusion

Ichiro Ishiyama’s patent portfolio highlights contributions to optical systems for aligning semiconductor components and transferring patterns, with a focus on precision and compensation for optical-path variations.