Kalispell, MT, United States of America

Ian Sharp

USPTO Granted Patents = 7 

Average Co-Inventor Count = 3.0

ph-index = 6

Forward Citations = 154(Granted Patents)


Company Filing History:


Years Active: 2001-2004

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7 patents (USPTO):Explore Patents

Title: Innovations by Ian Sharp in Semiconductor Processing

Introduction

Ian Sharp is a notable inventor based in Kalispell, MT (US), recognized for his contributions to semiconductor processing technology. He holds a total of 7 patents, showcasing his innovative approach to enhancing the efficiency and effectiveness of wafer processing.

Latest Patents

One of Ian Sharp's latest patents is titled "Method and apparatus for processing wafers under pressure." This invention involves a system for high-pressure drying of semiconductor wafers. The process includes inserting a wafer into an open vessel, immersing it in a liquid, sealing the vessel, and pressurizing it with an inert gas. The controlled draining of the liquid is achieved using a moveable drain that extracts water from just below the gas-liquid interface. This high-pressure environment suppresses the boiling point of liquids, allowing for higher temperatures to optimize reactivity. Additionally, megasonic waves are utilized with pressurized fluid to enhance cleaning performance.

Another significant patent is the "Substrate drying method for use with a surface tension effect dryer with porous vessel walls." This method involves a processor and technique for rinsing and drying semiconductor substrates. It features a process vessel contained within an outer containment vessel, where a diluted organic vapor creates a Marangoni effect flow along the surface of the processing liquid. The porous walls of the process vessel allow residual chemicals and unwanted materials to flow out, maintaining a stable surface tension gradient for consistent drying.

Career Highlights

Ian Sharp has made substantial contributions to the field of semiconductor technology through his work at Semitool, Inc. His innovative patents have significantly advanced the methods used in wafer processing, making him a key figure in the industry.

Collaborations

Ian has collaborated with notable coworkers such as Eric J Bergman and Craig P Meuchel, contributing to the development of cutting-edge technologies in semiconductor processing.

Conclusion

Ian Sharp's innovative patents and contributions to semiconductor processing highlight his expertise and commitment to advancing technology in this field. His work continues to influence the industry and improve the efficiency of wafer processing methods.

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