Devon, United Kingdom

Ian Richard Hooper

This inventor holds 1 USPTO granted patent. Top assignee: Attomarker Limited. Active years: 2013.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Ian Richard Hooper. Retrieved from https://idiyas.com/inventor/ian-richard-hooper-mgex9nmu

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2013

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1 patent (USPTO):Explore Patents

Title: Ian Richard Hooper: Innovator in Surface Plasmon Ellipsometry

Introduction

Ian Richard Hooper is a notable inventor based in Devon, GB. He has made significant contributions to the field of surface plasmon ellipsometry, particularly through his innovative methods that enhance the sensitivity of analytical apparatuses.

Latest Patents

Hooper holds a patent for a "Method of optimising the sensitivity of a surface plasmon ellipsometry apparatus." This patent discloses a method that includes calculating a sensitivity map for plasmon ellipsometry, which defines variations in sensitivity based on the angle of incidence and polarization angle of polarized light. The method aims to configure the apparatus to operate within a region of maximum sensitivity, thereby improving the accuracy of surface analysis.

Career Highlights

Hooper is associated with Attomarker Limited, where he applies his expertise in developing advanced analytical techniques. His work has been instrumental in pushing the boundaries of surface analysis technology.

Collaborations

Hooper has collaborated with notable colleagues, including John Roy Sambles and Ciaran Eoin Stewart, contributing to the advancement of research in their field.

Conclusion

Ian Richard Hooper's innovative work in surface plasmon ellipsometry exemplifies the impact of dedicated inventors in enhancing analytical technologies. His contributions continue to influence the field and inspire future innovations.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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