Washington, DC, United States of America

Ian D McCue

This inventor holds 2 USPTO granted patents and 2 published patent applications. Top assignee: Johns Hopkins University. Active years: 2024-2025.

USPTO Granted Patents = 2 

% Patents Active = 100.0

Average Co-Inventor Count = 6.0

ph-index = 1


Company Filing History:


Years Active: 2024-2025

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2 patents (USPTO):Explore Patents

Title: Ian D McCue: Innovator in Additive Manufacturing

Introduction

Ian D McCue is a prominent inventor based in Washington, DC. He has made significant contributions to the field of additive manufacturing, holding 2 patents that showcase his innovative approach to creating three-dimensional articles.

Latest Patents

One of Ian's latest patents is focused on the localized tailoring of three-dimensional articles via additive manufacturing. This patent describes processes and systems that involve the formation of voxels and portions of three-dimensional articles with varying properties. The processes include adjustments to laser beam parameters such as power level, exposure time, hatch spacing, point distance, velocity, and energy density during the formation of selected voxels. Additionally, the patent discloses methods for localized secondary heat treatment of certain voxels at temperatures below the melting point, allowing for property changes without compromising the integrity of the article.

Career Highlights

Ian D McCue is affiliated with The Johns Hopkins University, where he continues to advance research in additive manufacturing. His work is characterized by a commitment to enhancing the capabilities of three-dimensional printing technologies.

Collaborations

Ian collaborates with notable colleagues, including Steven M Storck and Morgana M Trexler, who contribute to his research endeavors and innovations in the field.

Conclusion

Ian D McCue is a key figure in the realm of additive manufacturing, with a focus on improving the properties of three-dimensional articles through innovative techniques. His contributions are paving the way for advancements in this exciting field.

Profile summary based on public USPTO records.
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