Swavesey, United Kingdom

Ian Andrew Gardner

This inventor holds 1 USPTO granted patent. Top assignee: Other. Active years: 2005.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Ian Andrew Gardner. Retrieved from https://idiyas.com/inventor/ian-andrew-gardner-cgtr6dlc

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 73(Granted Patents)


Company Filing History:

goldMedal1 out of 834,601 
Other
 patents

Years Active: 2005

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1 patent (USPTO):Explore Patents

Title: Ian Andrew Gardner: Innovator in Masking Pattern Technology

Introduction

Ian Andrew Gardner is a notable inventor based in Swavesey, GB. He has made significant contributions to the field of technology, particularly in the area of masking patterns. His innovative approach has led to the development of a unique method that utilizes droplet ejection techniques.

Latest Patents

Ian holds a patent for a "Method of forming a masking pattern on a surface." This method involves depositing droplets of deposition material on a surface to create a masking pattern. The technique allows for the formation of multiple discrete or coalesced extended portions, showcasing his inventive capabilities.

Career Highlights

Throughout his career, Ian has demonstrated a commitment to advancing technology through his inventions. His work has not only contributed to his field but has also paved the way for future innovations. Ian's patent reflects his expertise and dedication to improving methods in technology.

Collaborations

Ian has collaborated with notable colleagues, including Eric Bresler and Stuart Philip Speakman. These partnerships have likely enriched his work and contributed to the success of his inventions.

Conclusion

Ian Andrew Gardner is a distinguished inventor whose work in masking pattern technology exemplifies innovation and creativity. His contributions continue to influence the field, and his patent stands as a testament to his inventive spirit.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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