I Sak Lee

Title: I Sak Lee: Innovator in Oxide Thin Film Transistors

Introduction

I Sak Lee is a prominent inventor based in Paju-si, South Korea. He has made significant contributions to the field of semiconductor technology, particularly in the development of oxide thin film transistors. His innovative work has led to the filing of a patent that showcases his expertise and creativity in this area.

Latest Patents

I Sak Lee holds a patent for an "Oxide thin film transistor including photocatalyst layer and method for manufacturing the same." This patent discloses a method for manufacturing an oxide thin film transistor that involves several key steps. These steps include forming a gate electrode on a substrate, creating an oxide semiconductor thin film insulated from the gate electrode using a first mask, and forming an electrode on the oxide semiconductor thin film. The process also includes applying an oxidizer in one area of the electrode and subsequently annealing the electrode.

Career Highlights

I Sak Lee is affiliated with Yonsei University, where he continues to engage in research and development in the field of semiconductor technology. His work at the university allows him to collaborate with other experts and contribute to advancements in the industry.

Collaborations

I Sak Lee has worked alongside notable colleagues such as Hyun Jae Kim and Jong Bin An. Their collaborative efforts have further enhanced the research and development initiatives within their field.

Conclusion

I Sak Lee's innovative contributions to oxide thin film transistors exemplify his dedication to advancing semiconductor technology. His patent and ongoing work at Yonsei University highlight his role as a key figure in this important area of research.