Sungnam, South Korea

I C Jang

This inventor holds 1 USPTO granted patent. Top assignee: Lam Research Corporation. Active years: 2014.


% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 15(Granted Patents)


Company Filing History:


Years Active: 2014

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1 patent (USPTO):Explore Patents

Title: I C Jang: Innovator in Plasma Etch Technology

Introduction

I C Jang is a notable inventor based in Sungnam, South Korea. He has made significant contributions to the field of electronic device manufacturing, particularly through his innovative patent related to plasma etching methods. His work focuses on addressing challenges in the etching process, which is crucial for the production of electronic components.

Latest Patents

I C Jang holds a patent for a plasma etch method designed to reduce micro-loading. This method is essential for producing a plurality of etched features in electronic devices while avoiding micro-loading problems. The patent describes a process that maintains more uniform sidewall profiles and critical dimensions. The method involves performing a first time-divisional plasma etch process step within a plasma chamber, followed by a flash process step to remove any polymers from exposed surfaces. This innovative approach allows for the independent execution of the flash process, ensuring that the etching depth can be achieved with precision.

Career Highlights

I C Jang is associated with Lam Research Corporation, a leading company in the semiconductor equipment industry. His work at Lam Research has positioned him as a key player in advancing etching technologies that are vital for modern electronic devices. His expertise in plasma etching has contributed to the development of more efficient manufacturing processes.

Collaborations

I C Jang has collaborated with notable colleagues, including Shenjian Liu and Tom A Kamp. These collaborations have fostered an environment of innovation and have led to advancements in the field of semiconductor manufacturing.

Conclusion

I C Jang's contributions to plasma etch technology exemplify the importance of innovation in the electronics industry. His patent for a method to reduce micro-loading highlights his commitment to improving manufacturing processes. Through his work at Lam Research Corporation and collaborations with esteemed colleagues, I C Jang continues to influence the future of electronic device production.

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