Hwasung, South Korea

Hyunjin Lee

This inventor holds 1 USPTO granted patent. Top assignee: Samsung Display Co., Ltd.. Active years: 2018.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hyunjin Lee. Retrieved from https://idiyas.com/inventor/hyunjin-lee-n2l9c0sc

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:


Years Active: 2018

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1 patent (USPTO):Explore Patents

Title: Hyunjin Lee: Innovator in Display Technology

Introduction

Hyunjin Lee is a prominent inventor based in Hwasung, South Korea. He has made significant contributions to the field of display technology, particularly through his innovative patent related to inkjet printing methods.

Latest Patents

Hyunjin Lee holds a patent titled "Method of controlling film thickness distribution and method of manufacturing display apparatus using the method." This patent describes an inkjet printing method that involves setting a first region to be printed at a constant print density within a target region. It also includes setting a second region within the target region, which is closer to the edge and printed at a varying print density according to position. The method generates control data for multiple nozzles on an inkjet head to facilitate the printing process.

Career Highlights

Hyunjin Lee is currently employed at Samsung Display Co., Ltd., where he continues to push the boundaries of display technology. His work has been instrumental in enhancing the quality and efficiency of display manufacturing processes.

Collaborations

Hyunjin collaborates with talented colleagues, including Seungdon Lee and Minsoo Kim, who contribute to the innovative environment at Samsung Display Co., Ltd.

Conclusion

Hyunjin Lee's contributions to display technology through his innovative patent demonstrate his expertise and commitment to advancing the field. His work continues to influence the industry and pave the way for future innovations.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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