Cheonan-si, South Korea

Hyungchul Moon

USPTO Granted Patents = 5 

Average Co-Inventor Count = 1.7

ph-index = 2

Forward Citations = 5(Granted Patents)


Location History:

  • Chungcheongnam-do, KR (2020)
  • Cheonan-si, KR (2019 - 2024)

Company Filing History:


Years Active: 2019-2024

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5 patents (USPTO):Explore Patents

Title: Hyungchul Moon: Innovator in Substrate Processing Technology

Introduction

Hyungchul Moon is a notable inventor based in Cheonan-si, South Korea. He has made significant contributions to the field of substrate processing, holding a total of 5 patents. His work focuses on improving the efficiency and effectiveness of substrate processing apparatuses.

Latest Patents

One of his latest patents is a substrate processing apparatus designed to minimize the effect of a filling gas during substrate processing. This innovative apparatus includes a substrate supporting unit, at least one ring surrounding the substrate supporting unit, a processing unit on the substrate supporting unit, and an exhaust unit connected to a reaction space. The design allows for the separation of gases in the reaction space and the lower space, enhancing the processing of substrates. Another notable patent is a cooling device that controls the temperature of the upper portion of a reactor, particularly for gas supply devices like shower heads. This cooling device utilizes a vortex tube to supply a cooling gas, effectively managing the temperature of heated gas supply devices.

Career Highlights

Hyungchul Moon has worked with prominent companies in the industry, including Asm IP Holding B.V. and Semes Co., Ltd. His experience in these organizations has contributed to his expertise in substrate processing technologies.

Collaborations

He has collaborated with various professionals in his field, including his coworker WonKi Jeong, to further advance substrate processing innovations.

Conclusion

Hyungchul Moon's contributions to substrate processing technology demonstrate his commitment to innovation and excellence. His patents reflect a deep understanding of the challenges in the field and offer practical solutions to enhance processing efficiency.

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