The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 28, 2019
Filed:
Oct. 19, 2017
Applicant:
Semes Co., Ltd, Cheonan-si, Chungcheongnam-do, KR;
Inventors:
Hyungchul Moon, Cheonan-si, KR;
Hyung Joon Kim, Pyeongtaek-si, KR;
Assignee:
Semes Co., Ltd., Chungcheongnam-do, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/32 (2006.01); H01L 21/3065 (2006.01); H01L 21/3213 (2006.01); H01L 21/67 (2006.01);
U.S. Cl.
CPC ...
H01J 37/3244 (2013.01); H01J 37/32009 (2013.01); H01J 37/32449 (2013.01); H01J 37/32477 (2013.01); H01J 37/32642 (2013.01); H01J 37/32715 (2013.01); H01J 37/32862 (2013.01); H01J 37/32871 (2013.01); H01L 21/3065 (2013.01); H01L 21/32136 (2013.01); H01L 21/67069 (2013.01);
Abstract
Substrate treating systems are disclosed. The system may include a chamber with a processing space, a supporting unit provided in the processing space to support a substrate, a gas supplying unit provided in the processing space to supply gas into the processing space, a plasma source unit generating plasma from the gas, and a liner unit disposed to enclose the supporting unit. The supporting unit may include a supporting plate supporting a substrate. The liner unit may include an inner liner enclosing the supporting plate and an actuator vertically moving the inner liner.