Daejeon, South Korea

Hyung Jun Lim

This inventor holds 1 USPTO granted patent and 13 published patent applications and 1 EPO patent. Top assignee: Korea Institute of Machinery & Materials. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hyung Jun Lim. Retrieved from https://idiyas.com/inventor/hyung-jun-lim-ikmzyab4

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

% Patents Active = 100.0

 

Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Hyung Jun Lim: Inventor of a Digital Exposure System

Introduction

Hyung Jun Lim is an inventor associated with Daejeon, South Korea. His work includes a patent for a digital exposure system designed to project patterns onto a photosensitive substrate.

Latest Patents

Lim is credited with 1 patent, titled “Digital Exposure System.” The invention combines a light source, a digital mirror device, an optical system, and a substrate scanner. The digital mirror device forms a two-dimensional pattern image, which the optical system converts into a one-dimensional image. The scanner moves the substrate so the image can be continuously projected onto its photosensitive layer. The system is designed to provide a uniform image along the scan direction and the target pattern across that direction.

Career Highlights

Lim’s listed organizational affiliations include the Korea Institute of Machinery & Materials and Koh Young Technology Inc. The available information does not specify his roles or dates of employment at these organizations.

Collaborations

Lim’s named coworkers include Won Seok Chang and Won-Sup Lee. The available information does not detail their specific contributions or collaboration on the digital exposure system.

Conclusion

Hyung Jun Lim’s patent describes a scanning-based digital exposure system that converts a two-dimensional pattern into a one-dimensional image for controlled substrate exposure.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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