Company Filing History:
1 out of 11,004 
1 out of 832,880 Years Active: 2015
Title: Hyung Hwan Kim: Innovator in Semiconductor Technologies
Introduction: Hyung Hwan Kim is a distinguished inventor based in Icheon-si, South Korea. With a focus on advancements in semiconductor technology, he has contributed significantly to the field through his innovative methods and techniques. His work emphasizes the improvement of manufacturing processes that are vital for producing effective semiconductor devices.
Latest Patents: Hyung Hwan Kim holds a notable patent titled "Method for forming silicon oxide film of semiconductor device." This patent discloses a method for creating a silicon oxide film, which incorporates surface processing using an amine-based compound. This innovative approach enhances both the uniformity and density of the silicon oxide film, ultimately contributing to the reliability and efficiency of semiconductor devices.
Career Highlights: Throughout his career, Hyung Hwan Kim has worked at prominent companies in the semiconductor industry, including SK Hynix Inc. His experience and expertise in manufacturing and materials science have paved the way for significant advancements in semiconductor technologies.
Collaborations: Hyung Hwan Kim has had the opportunity to collaborate with notable professionals in the field, such as Hyung Soon Park and Kwon Hong. These collaborations have fostered a rich environment for innovation and have led to the development of impactful technologies in the semiconductor sector.
Conclusion: Hyung Hwan Kim’s contributions to semiconductor technology are remarkable, and his patent signifies a step forward in enhancing semiconductor production processes. His work continues to inspire future innovations in the electronics industry, demonstrating the important role of inventors in technological advancement.