Hyunbae Kim

Title: Hyunbae Kim - Innovator in Plasma Processing Technology

Introduction

Hyunbae Kim is an inventor based in Suwon-si, South Korea. He is known for his contributions to the field of plasma processing technology. Although he currently holds no granted patents, his innovative ideas are reflected in his latest patent applications.

Latest Patent Applications

Hyunbae Kim has recently filed applications for two significant inventions. The first is a "PLASMA PROCESSING APPARATUS," which includes a chamber body with an electrostatic chuck that supports a substrate. This apparatus features a high-frequency power supply device that generates plasma from gas supplied to the chamber. Additionally, it includes a bias power supply device that supplies pulse power for ion acceleration to the lower electrode. This device is designed to supply a positive voltage pulse when the target duty ratio for ion acceleration exceeds a threshold.

The second application is for a "VOLTAGE WAVEFORM CONTROLLING METHOD, SUBSTRATE PROCESSING METHOD, AND SUBSTRATE PROCESSING APPARATUS." This method involves generating a non-sinusoidal voltage waveform that includes various periods, such as a pulse period with positive bias voltage and a ramp period with negative bias voltage. The method also adjusts the length of the negative voltage period to ensure optimal performance during the processing cycle.

Conclusion

Hyunbae Kim is an emerging inventor in the field of plasma processing technology, with innovative applications that could significantly impact the industry. His work demonstrates a commitment to advancing technology through inventive solutions.