Hyun Jun Kim

Title: Innovations of Hyun Jun Kim in Plasma Technology

Introduction

Hyun Jun Kim is a notable inventor based in Hwaseong-si, South Korea. He has made significant contributions to the field of plasma technology, holding two patents that showcase his innovative approach to plasma generation and substrate treatment.

Latest Patents

His latest patents include a "Plasma generating apparatus using mutual inductive coupling" and a "substrate treating apparatus comprising the same." The plasma generating apparatus utilizes an RF power supply to provide an RF signal, which is then applied to a plurality of electromagnetic field applying units. These units induce an electromagnetic field through mutually-inductively coupled coils. The substrate treating apparatus is designed to enhance the efficiency of plasma generation, thereby improving the treatment of various substrates.

Another significant patent is the "plasma generating device, method of controlling the same, and substrate processing device including the plasma generating device." This invention features a plasma chamber where gas is injected to generate plasma. It includes two electromagnetic inductors that induce electromagnetic fields within the chamber, along with a controller that manages the power supplied to these inductors by adjusting the impedance of connected loads.

Career Highlights

Hyun Jun Kim is currently employed at Psk Inc., where he continues to develop innovative technologies in plasma applications. His work has positioned him as a key figure in advancing plasma technology, particularly in industrial applications.

Collaborations

He collaborates with talented coworkers, including Hee Sun Chae and Jeong Hee Cho, who contribute to the innovative environment at Psk Inc. Their teamwork fosters a culture of creativity and technical excellence.

Conclusion

Hyun Jun Kim's contributions to plasma technology through his patents reflect his dedication to innovation and advancement in the field. His work not only enhances the understanding of plasma generation but also paves the way for future developments in substrate treatment technologies.