Company Filing History:
Years Active: 2007-2008
Title: Hyun Joon Cho: Innovator in Photomask Cleaning Technologies
Introduction
Hyun Joon Cho is a notable inventor based in Gyeonggi-do, South Korea. He has made significant contributions to the field of photolithography through his innovative methods for cleaning photomasks. With a total of 2 patents, his work is essential for enhancing the efficiency and effectiveness of photolithography processes.
Latest Patents
Hyun Joon Cho's latest patents include a method for cleaning a photomask and a device for the same purpose. The method disclosed prevents haze from being generated on the surface of the photomask during the photolithography process. The photomask undergoes heat treatment to remove residual ions on its surface, which induces curing and oxidation of the Cr and MoSiON layers. This process effectively prevents the diffusion of ions and suppresses the etching of Cr and MoSiON layers during cleaning. As a result, there is a significant reduction in changes to the phase and transmissivity of the optical properties of these materials.
Career Highlights
Hyun Joon Cho is currently employed at Pkl Co., Ltd., where he continues to develop and refine his innovative cleaning technologies. His work has been instrumental in advancing the field of photolithography, making processes more reliable and efficient.
Collaborations
He has collaborated with notable coworkers, including Yong Dae Kim and Jong Min Kim, who have contributed to his research and development efforts.
Conclusion
Hyun Joon Cho's contributions to photomask cleaning technologies are significant and impactful. His innovative methods and devices are paving the way for advancements in photolithography, ensuring higher quality and efficiency in the industry.