The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 06, 2007
Filed:
Mar. 20, 2006
Yong Dae Kim, Chungcheongnam-do, KR;
Jong Min Kim, Daejon, KR;
Han Byul Kang, Gyeonggi-do, KR;
Hyun Joon Cho, Gyeonggi-do, KR;
Sang Soo Choi, Daejon, KR;
Yong Dae Kim, Chungcheongnam-do, KR;
Jong Min Kim, Daejon, KR;
Han Byul Kang, Gyeonggi-do, KR;
Hyun Joon Cho, Gyeonggi-do, KR;
Sang Soo Choi, Daejon, KR;
PKL Co., Ltd., , KR;
Abstract
Disclosed herein is a device and a method of cleaning a photomask, which prevents haze from being generated on a surface of the photomask during a photolithography process. The photomask is heat treated to remove residual ions on a surface thereof and to induce curing and oxidation of Cr and MoSiON layers, thereby preventing diffusion of the ions. Etching of Cr and MoSiON layers due to a cleaning process is suppressed in order to significantly reduce a change in phase and transmissivity of optical properties of Cr and MoSiON.