Company Filing History:
Years Active: 2007-2008
Title: Han Byul Kang: Innovator in Photomask Cleaning Technologies
Introduction
Han Byul Kang is a notable inventor based in Gyeonggi-do, South Korea. He has made significant contributions to the field of photomask cleaning technologies, holding 2 patents that enhance the efficiency and effectiveness of photolithography processes.
Latest Patents
Kang's latest patents include a "Method for cleaning a photomask" and a "Device and method for cleaning photomask." Both inventions focus on preventing haze from forming on the surface of photomasks during photolithography. The method involves heat treatment to eliminate residual ions on the photomask's surface, which induces curing and oxidation of the Cr and MoSiON layers. This process effectively prevents the diffusion of ions and suppresses etching of these layers, significantly reducing changes in phase and transmissivity of their optical properties.
Career Highlights
Han Byul Kang is currently employed at Pkl Co., Ltd., where he continues to innovate in the field of photomask technologies. His work has been instrumental in advancing the quality and reliability of photolithography processes, which are critical in semiconductor manufacturing.
Collaborations
Kang collaborates with talented coworkers, including Yong Dae Kim and Jong Min Kim, who contribute to the development and refinement of his innovative technologies.
Conclusion
Han Byul Kang is a prominent inventor whose work in photomask cleaning technologies has made a significant impact on the semiconductor industry. His patents reflect a commitment to improving photolithography processes, ensuring higher quality and efficiency in manufacturing.