Daegu, South Korea

Hyun-Jin Kim

This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Semes Co., Ltd.. Active years: 2023.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hyun-Jin Kim. Retrieved from https://idiyas.com/inventor/hyun-jin-kim-1fbocn25

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 6.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2023

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1 patent (USPTO):Explore Patents

Title: Innovations of Hyun-Jin Kim in Substrate Treatment Technology

Introduction

Hyun-Jin Kim is a notable inventor based in Daegu, South Korea. He has made significant contributions to the field of substrate treatment technology, particularly with his innovative patent that addresses temperature control in substrate processing.

Latest Patents

Hyun-Jin Kim holds a patent for a "Substrate treating apparatus and method for controlling temperature of ferrite core." This invention includes a chamber designed for substrate treatment, a substrate support assembly, a gas supply unit, a plasma generating unit, and a substrate temperature control unit. The temperature control unit features multiple heaters installed in various areas of the support plate, a power supply part for the heaters, a ferrite core to interrupt low-frequency signals, and air cores to manage high-frequency signals.

Career Highlights

Hyun-Jin Kim is currently employed at Semes Co., Ltd., where he continues to develop and refine technologies related to substrate treatment. His work has been instrumental in advancing the efficiency and effectiveness of substrate processing methods.

Collaborations

Hyun-Jin collaborates with talented coworkers, including Ogsen Galstyan and Junpyo Lee, who contribute to the innovative environment at Semes Co., Ltd.

Conclusion

Hyun-Jin Kim's contributions to substrate treatment technology exemplify the impact of innovative thinking in engineering. His patent reflects a commitment to enhancing substrate processing methods, showcasing the importance of collaboration and creativity in technological advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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