Taejon, South Korea

Hyuk-Jin Cha

This inventor holds 1 USPTO granted patent. Top assignee: International Business Machines Corporation. Active years: 1999.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hyuk-Jin Cha. Retrieved from https://idiyas.com/inventor/hyuk-jin-cha-6xk7mnue

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 8.0

ph-index = 1

Forward Citations = 13(Granted Patents)


Company Filing History:


Years Active: 1999

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1 patent (USPTO):Explore Patents

Title: Hyuk-Jin Cha: Innovator in Integrated Circuit Technology

Introduction

Hyuk-Jin Cha is a notable inventor based in Taejon, South Korea. He has made significant contributions to the field of integrated circuit technology. His innovative work has led to the development of a unique integrated circuit device that enhances manufacturing processes.

Latest Patents

Hyuk-Jin Cha holds 1 patent for his invention titled "Integrated circuit device and process for its manufacture." This invention relates to an integrated circuit device that comprises a substrate, metallic circuit lines positioned on the substrate, and a dielectric material positioned on the circuit lines. The dielectric material is composed of the reaction product of an organic polysilica and polyamic ester, which is preferably terminated with an alkoxysilyl alkyl group.

Career Highlights

Hyuk-Jin Cha is currently employed at International Business Machines Corporation, commonly known as IBM. His role at IBM allows him to work on cutting-edge technologies and contribute to advancements in integrated circuits.

Collaborations

Some of his notable coworkers include Do Yeung Yoon and Kenneth Raymond Carter. Their collaboration in various projects has further enriched the innovative environment at IBM.

Conclusion

Hyuk-Jin Cha's contributions to integrated circuit technology exemplify the spirit of innovation. His patent reflects a significant advancement in the manufacturing process of integrated circuits.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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