Yongin, South Korea

Hyoung Do Kim

This inventor holds 2 USPTO granted patents and 10 published patent applications. Top assignee: Samsung Display Co., Ltd.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hyoung Do Kim. Retrieved from https://idiyas.com/inventor/hyoung-do-kim-cq4str8c

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 2 

% Patents Active = 50.0

Average Co-Inventor Count = 6.0

ph-index = 1


Company Filing History:


Years Active: 2026

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2 patents (USPTO):Explore Patents

Title: Hyoung Do Kim - Innovator in Display Technology

Introduction

Hyoung Do Kim is a notable inventor based in Yongin, South Korea. He has made significant contributions to the field of display technology, particularly through his innovative patent.

Latest Patents

Hyoung Do Kim holds a patent for a display device and its manufacturing method. This invention includes a substrate, a conductive pattern layer, a buffer layer, an active pattern layer with a channel region and a conductive region, an insulating pattern layer, an oxide pattern layer, a gate electrode, and a connecting member. The connecting member and the oxide pattern layer are made from the same material, showcasing a unique approach to display device design. He has 1 patent to his name.

Career Highlights

Hyoung Do Kim is currently employed at Samsung Display Co., Ltd., where he continues to work on advancing display technologies. His role at such a prominent company highlights his expertise and the value of his contributions to the industry.

Collaborations

Hyoung Do Kim has collaborated with talented coworkers, including Kilim Han and Chul Won Park. Their teamwork reflects a strong collaborative spirit in the pursuit of innovation.

Conclusion

Hyoung Do Kim is a distinguished inventor whose work in display technology has the potential to influence future advancements in the field. His patent demonstrates a commitment to innovation and excellence in design.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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