Taejon, South Korea

Hyoung Bok Lee

This inventor holds 1 USPTO granted patent. Top assignee: Electronics and Telecommunications Research Institute. Active years: 2006.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hyoung Bok Lee. Retrieved from https://idiyas.com/inventor/hyoung-bok-lee

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 44(Granted Patents)


Company Filing History:


Years Active: 2006

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Hyoung Bok Lee: Innovator in Patent Mapping Technology

Introduction

Hyoung Bok Lee is a notable inventor based in Taejon, South Korea. He has made significant contributions to the field of patent mapping technology. His innovative approach focuses on utilizing technical field words to enhance the process of drawing patent maps.

Latest Patents

Hyoung Bok Lee holds a patent for a "System for drawing patent map using technical field word and method therefor." This invention discloses a system and method for drawing a patent map by extracting significant words from patent data. The process involves calculating weight values of these words after removing unnecessary terms, allowing for a more accurate representation of patent information.

Career Highlights

Hyoung Bok Lee is affiliated with the Electronics and Telecommunications Research Institute, where he applies his expertise in patent technology. His work has been instrumental in advancing the methodologies used in patent analysis and visualization.

Collaborations

He has collaborated with notable colleagues such as Jeong Wook Won and Jai Sang Koh, contributing to various projects that enhance the understanding and accessibility of patent information.

Conclusion

Hyoung Bok Lee's innovative work in patent mapping technology exemplifies the importance of utilizing technical language to improve patent analysis. His contributions continue to influence the field and support advancements in intellectual property management.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…