Asan, South Korea

Hyo Won Park

This inventor holds 1 USPTO granted patent. Top assignees: Enf Technology Co., Ltd., Samsung Display Co., Ltd.. Active years: 2018.


% Patents Active = 100.0

Average Co-Inventor Count = 8.0

ph-index = 1


Company Filing History:


Years Active: 2018

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1 patent (USPTO):Explore Patents

Title: Hyo Won Park: Innovator in Glycol Based Compounds

Introduction

Hyo Won Park is a notable inventor based in Asan, South Korea. He has made significant contributions to the field of chemical engineering, particularly in the manufacturing of high purity glycol based compounds. His innovative methods have the potential to impact various industries that rely on these compounds.

Latest Patents

Hyo Won Park holds a patent for a "Method for manufacturing high purity glycol based compound." This method involves agitating a mixture of a first glycol based compound, a hydrazide based compound, and a sulfonic acid based compound. The process includes performing fractional distillation of the resultant materials to recover a second glycol based compound with a formaldehyde content of 0 ppm. This innovation highlights his commitment to developing cleaner and more efficient manufacturing processes.

Career Highlights

Throughout his career, Hyo Won Park has worked with prominent companies such as Samsung Display Co., Ltd. and Enf Technology Co., Ltd. His experience in these organizations has allowed him to refine his skills and contribute to various projects that advance technology in the chemical sector.

Collaborations

Hyo Won Park has collaborated with talented individuals in his field, including Bong Kyun Kim and Jae Woo Jeong. These partnerships have fostered a creative environment that encourages innovation and the sharing of ideas.

Conclusion

Hyo Won Park is a distinguished inventor whose work in glycol based compounds showcases his expertise and dedication to innovation. His contributions to the field are significant and continue to influence advancements in chemical manufacturing.

Profile summary based on public USPTO records.
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