Hyo Seon Suh

Title: Hyo Seon Suh: Innovator in Polymer Coating Technologies

Introduction

Hyo Seon Suh is a notable inventor based in Woodridge, IL (US). He has made significant contributions to the field of polymeric topcoat fabrication. His innovative methods have implications for various applications in material science and engineering.

Latest Patents

Hyo Seon Suh holds a patent for a "Method of forming topcoat for patterning." This patent discloses a method for the fabrication of polymeric topcoat via initiated chemical vapor deposition (iCVD) or photoinitiated chemical vapor deposition (piCVD) in conjunction with directed self-assembly (DSA) of block copolymers. The method enables the generation of high-resolution patterns. A topcoat deposited by iCVD or piCVD allows for conformal, ultra-thin, uniform, pinhole-free coatings. This technology facilitates the use of a diversity of block copolymer (BCP) materials for DSA and supports the direct and seamless integration of the topcoats for a pattern transfer process. Hyo Seon Suh has 1 patent to his name.

Career Highlights

Throughout his career, Hyo Seon Suh has worked at prestigious institutions, including the Massachusetts Institute of Technology and the University of Chicago. His work has been instrumental in advancing the understanding and application of polymeric materials in various technological fields.

Collaborations

Hyo Seon Suh has collaborated with notable colleagues, including Do Han Kim and Priya Moni. These collaborations have contributed to the development of innovative solutions in polymer science.

Conclusion

Hyo Seon Suh is a distinguished inventor whose work in polymeric topcoat technologies has paved the way for advancements in material science. His contributions continue to influence the field and inspire future innovations.