Hyi-Jeong Park

Title: Hyi-Jeong Park: Innovator in Semiconductor Technology

Introduction

Hyi-Jeong Park is a prominent inventor based in Seoul, South Korea. He has made significant contributions to the field of semiconductor technology, holding a total of 3 patents. His work focuses on innovative methods for fabricating semiconductor devices, which are crucial for modern electronic applications.

Latest Patents

Hyi-Jeong Park's latest patents include a semiconductor device and a method of fabricating the same. This invention provides a semiconductor device utilizing a DMOS device, which consists of a semiconductor substrate with a first conductive type well. The device features a first conductive type gate electrode, a second conductive type body electrode, and a first conductive type drain electrode, among other components. Another notable patent involves a semiconductor device formed using a single polysilicon process, which includes a source/drain and a gate created through a doped polysilicon process. This method outlines the steps for forming a gate insulating layer, implanting impurities, and patterning the conductive layer.

Career Highlights

Hyi-Jeong Park is currently employed at Fairchild Korea Semiconductor Ltd., where he continues to advance semiconductor technology. His expertise in the field has positioned him as a key player in the development of innovative semiconductor solutions.

Collaborations

Throughout his career, Hyi-Jeong Park has collaborated with notable colleagues, including Jong-ho Park and Chang-ki Jeon. These partnerships have contributed to the successful development of his patented technologies.

Conclusion

Hyi-Jeong Park's contributions to semiconductor technology through his patents and collaborations highlight his role as an influential inventor in the industry. His work continues to impact the advancement of electronic devices and systems.