This inventor holds 1 USPTO granted patent. Top assignee: Samsung Electronics Co., Ltd.. Active years: 2000.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2000
Title: Hyeung-ki Kim: Innovator in Clean Room Technology
Introduction
Hyeung-ki Kim is a notable inventor based in Seoul, South Korea. He is recognized for his innovative contribution to clean room operations through his unique patent. As a valued member of Samsung Electronics Co., Ltd., Kim has made significant strides in ensuring operational efficiency and cleanliness within sensitive environments.
Latest Patents
Hyeung-ki Kim holds a patent for a "Clean room smock having an integral air passage." This innovative smock is designed for clean room operators and includes an upper material part to cover the upper body and a lower material part for the lower body, both integrally formed. A key feature of this smock is its air passage that connects the upper and lower parts, including a discharge section that allows for effective air venting within the smock.
Career Highlights
Kim has developed this patent while contributing to Samsung Electronics Co., Ltd., a leading global technology company. His work exemplifies a commitment to enhancing safety and efficiency in clean room environments, reflecting the innovative spirit of his organization.
Collaborations
Throughout his career, Hyeung-ki Kim has worked alongside esteemed colleagues such as Youn-soo Han and Hyun-joon Kim. These collaborations have likely fostered an environment of creativity and shared knowledge, crucial for innovation in technology and product development.
Conclusion
Hyeung-ki Kim stands out as an influential inventor in the realm of clean room technology. His patented design for a specialized smock is a testament to his dedication to improving operational standards in sensitive environments. As he continues his work at Samsung Electronics Co., Ltd., his contributions will undoubtedly further impact the industry.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
