Hyeongwon Jang

Title: Hyeongwon Jang: Innovator in Semiconductor Technology

Introduction

Hyeongwon Jang is a notable inventor based in Suwon, South Korea. He has made significant contributions to the field of semiconductor technology. His innovative work has led to the development of a unique semiconductor device that enhances performance and efficiency.

Latest Patents

Hyeongwon Jang holds 1 patent for a semiconductor device. This device includes a substrate featuring a peripheral active pattern defined by a device isolation layer. It also incorporates a gate structure on the peripheral active pattern, along with a gate spacer that covers a portion of the side surface of the gate structure. The gate structure consists of an insulating pattern structure and a metal pattern structure. The insulating pattern structure includes a recess with a maximum depth in a first direction parallel to the top surface of the substrate at a specified height. Additionally, the insulating pattern structure features a first gate insulating pattern and a high-k dielectric layer, which are sequentially stacked on the substrate's top surface. The gate spacer includes a protrusion that is inserted into the recess.

Career Highlights

Hyeongwon Jang is currently employed at Samsung Electronics Ltd., a leading company in the technology sector. His work at Samsung has allowed him to focus on advancing semiconductor technologies, contributing to the company's reputation for innovation and quality.

Collaborations

Hyeongwon Jang has collaborated with notable colleagues, including Sanggyu Ko and Hyuckchai Jung. These collaborations have fostered a creative environment that encourages the development of cutting-edge technologies.

Conclusion

Hyeongwon Jang's contributions to semiconductor technology exemplify the spirit of innovation. His patent for a semiconductor device showcases his expertise and commitment to advancing the field. His work at Samsung Electronics Ltd. continues to influence the technology landscape positively.