Company Filing History:
Years Active: 2018
Title: Hyeongmook Kim: Innovator in Photosensitive Resin Technology
Introduction
Hyeongmook Kim is a notable inventor based in Suwon-si, South Korea, with a focus on innovations in photosensitive resin technology. With a total of two patents to his name, he brings significant contributions to material science and photolithography.
Latest Patents
Hyeongmook Kim's latest patents showcase advancements in compound and polymer technologies. His first patent involves a photosensitive resin composition that includes an acrylic polymer, synthesized through the copolymerization of specific compounds and unsaturated monomers. This innovation is instrumental for applications that require precise and efficient color filtering. The second patent introduces a compound, along with a colorant and a positive photosensitive resin composition, leading to the development of specialized color filters. Both patents highlight Kim's commitment to enhancing the capabilities of resin materials in modern technology.
Career Highlights
Currently, Hyeongmook Kim is employed at Samsung SDI Co., Inc., a prominent company known for its innovations in battery technology and materials. His work in the field of photosensitive polymers sets him apart as an influential figure within the company, contributing to its reputation for cutting-edge developments.
Collaborations
In his professional journey, Hyeongmook Kim has collaborated closely with colleagues Kyuyoung Kim and Young Joon Lee. Together, they share a dedication to advancing research in photosensitive materials, fostering innovation through teamwork and expertise.
Conclusion
Hyeongmook Kim's contributions to the realm of photosensitive resin technology mark him as a significant inventor in his field. His patents not only demonstrate his innovative spirit but also reflect the ongoing advancements within the materials science industry, especially at Samsung SDI Co., Inc. Through continuous collaboration and research, Kim is poised to influence future developments in photolithographic applications.