The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 16, 2018
Filed:
Jan. 12, 2017
Applicant:
Samsung Sdi Co., Ltd., Yongin-si, Gyeonggi-do, KR;
Inventors:
Kyuyoung Kim, Suwon-si, KR;
Hyeongmook Kim, Suwon-si, KR;
Young Lee, Suwon-si, KR;
Myoungyoup Shin, Suwon-si, KR;
Seungjib Choi, Suwon-si, KR;
Assignee:
SAMSUNG SDI CO., LTD., Yongin-si, Gyeonggi-do, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 5/20 (2006.01); G03F 7/016 (2006.01); G03F 7/021 (2006.01); C08F 220/68 (2006.01); C09B 11/24 (2006.01); G02B 5/22 (2006.01); C09B 69/10 (2006.01); C07D 311/82 (2006.01); G03F 7/00 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0163 (2013.01); C07D 311/82 (2013.01); C08F 220/68 (2013.01); C09B 11/24 (2013.01); C09B 69/109 (2013.01); G02B 5/223 (2013.01); G03F 7/0007 (2013.01); G03F 7/021 (2013.01);
Abstract
A compound, an acrylic polymer formed by a copolymerization reaction of the compound with an ethylenic unsaturated monomer, photosensitive resin composition including the compound being represented by Chemical Formula 1 and a color filter: