Seoul, South Korea

Hyeong Sik Ko

This inventor holds 1 USPTO granted patent and 2 published patent applications. Top assignee: Eugene Technology Co., Ltd.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hyeong Sik Ko. Retrieved from https://idiyas.com/inventor/hyeong-sik-ko

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Hyeong Sik Ko: Innovator in Substrate Transfer Technology

Introduction

Hyeong Sik Ko is a notable inventor based in Seoul, South Korea. He has made significant contributions to the field of substrate processing technology. His innovative work has led to the development of a unique substrate transfer device.

Latest Patents

Hyeong Sik Ko holds a patent for a substrate transfer device and substrate processing apparatus. This invention relates to a substrate transfer device designed to sense deflection of an end-effector. The device includes an end-effector that extends in a first direction and supports a substrate. It also features an end-effector hand connected to one side of the end-effector, a horizontal movement unit for moving the end-effector, and a deflection sensing unit that includes a light emitting part and a light receiving part. This technology enhances the precision and efficiency of substrate processing.

Career Highlights

Hyeong Sik Ko is associated with Eugene Technology Co., Ltd., where he continues to innovate in substrate processing technologies. His work has been instrumental in advancing the capabilities of substrate transfer devices.

Collaborations

He has collaborated with notable colleagues, including Byoung Gyu Song and Hyeong Hwan Bae, contributing to various projects within the company.

Conclusion

Hyeong Sik Ko's contributions to substrate transfer technology exemplify his innovative spirit and dedication to advancing the field. His patent reflects a significant step forward in substrate processing efficiency and accuracy.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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