Seoul, South Korea

Hyeong Jun Cho

USPTO Granted Patents = 3 

Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:


Years Active: 2024-2025

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3 patents (USPTO):Explore Patents

Title: Hyeong Jun Cho: Innovator in Substrate Processing Technology

Introduction

Hyeong Jun Cho is a prominent inventor based in Seoul, South Korea. He has made significant contributions to the field of substrate processing technology, holding a total of 3 patents. His innovative work focuses on enhancing the efficiency and effectiveness of substrate processing devices.

Latest Patents

Hyeong Jun Cho's latest patents include a substrate processing device and a control method for such devices. This invention features a substrate transfer part designed to receive a transfer object, along with a jetting system that includes an ink jet body. The ink jet body jets and prints ink on the transfer object, utilizing an ink module transfer part and an encoder to output movement signals. Additionally, an ink ejection controller works in conjunction with the ink jet body to manage the timing of ink jetting. Another notable patent is a pressure control device and substrate treatment apparatus, which provides stable control of internal air pressure in a reservoir. This device includes an input terminal for source air pressure, intake and exhaust valves, a pressure sensor, and a controller that operates both valves simultaneously to maintain desired pressure levels.

Career Highlights

Hyeong Jun Cho is currently employed at Semes Co., Ltd., where he continues to develop innovative technologies in substrate processing. His work has significantly impacted the industry, leading to advancements in manufacturing processes.

Collaborations

Hyeong Jun Cho collaborates with talented coworkers, including Sang Min Ha and Jae Hong Kim. Their combined expertise fosters a creative environment that drives innovation in their projects.

Conclusion

Hyeong Jun Cho is a dedicated inventor whose work in substrate processing technology has led to multiple patents and advancements in the field. His contributions continue to shape the future of substrate processing devices.

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