The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 13, 2026
Filed:
Dec. 29, 2022
Semes Co., Ltd., Chungcheongnam-do, KR;
Jae Hong Kim, Chungcheongnam-do, KR;
Hyeong Jun Cho, Seoul, KR;
Sang Hyun Son, Busan, KR;
Sang Min Ha, Gyeonggi-do, KR;
SEMES CO., LTD., Chungcheongnam-Do, KR;
Abstract
The present invention provides a method for treating a substrate. The method for treating a substrate comprises: a monitoring step of calculating a flow rate of a liquid, comparing the calculated measurement flow rate of the liquid with a set flow rate of the liquid in a normal state, and determining whether an error occurs in the measurement flow rate; and when an error is determined to occur in the measurement flow rate in the monitoring step, a feedback step of performing feedback control of a discharge flow rate of the liquid discharged to the substrate, wherein the feedback step determines a type of the error, and differently performs the feedback control according to the determined type of the error.